Optical and Electrophysical Properties of the Germanium Oxynitride-Semiconductor Structure

Authors

  • Irakli Nakhutsrishvili Institute of Cybernetics of Georgian Technical University
  • Zurab Adamia

Keywords:

SEMICONDUCTORS, GERMANIUM OXYNITRIDE, OPTICAL PROPERTIES, ELECTROPHYSICAL PROPERTIES

Abstract

The paper studies the optical and electrophysical characteristics of dielectric films of germanium oxynitride obtained by nitridation of single-crystalline germanium with humid ammonia and deposition of reaction products on semiconductor substrates. These films create a high-quality interface with silicon and indium phosphide.

References

A.V. Rzhanov and I.G.Neizvestny. Thin Solid Films, vol. 58, p 37 (1979)

B.C.Hsu, Ch.H.Lin, P.-S.Kuo et al., Electron Device Lett., vol. 25, p 544 (2004)

Y.Fukuda, K.Kato, T.Toyota et al., Jap. Applied Physics, vol. 45, p 7351 (2006)

K.Kutsuki, G.Okamoto, T.Hosoi et al., Appl. Phys. Lett., vol. 95, p 022102 (2009)

J.Wang, Y.Asakura and Sh.Yin, Hazardous Materials, vol. 396, 122709 (2020)

Sh.J.Du, X.-X.Li, Y.Tian et al. Nuclear Sci. and Techniques, vol. 35, p 45 (2024)

V.Synorov, A.Kuznetsov and N.Aleinikov. High. Educ. Inst.-Phys., vol. 3, p 7 (1967)

N.Aleinikov, A.Barabashina and V.Synorov. Inorg. Chem., vol.12, p 3387 (1967)

Y.Igarashi, K.Kurudama and T.Niimi. Jap. Applied Physics, vol. 7, p 300 (1968)

H. Nagai and T.Niimi. Electrochem. Soc., vol. 115, p 671 (1968)

L. Vasilyeva, T.Kovalevskaya et al. Inorg. Materials, vol.5, p 1537 (1969)

T.Yashiro. Jap. Applied Physics, vol. 10, p 1961 (1971)

T. Yashiro. Electrochemical Soc., vol. 199, p 780 (1972)

V. Myakinenkov, V.Nogin, B.Anokhin et al. Semicond. Dev.,vol. 79, p (1973)

G. Shanable, W.Kern and R.Comizzoli. Electrochem. Soc.,122, p 1092 (1975)

G. Bagratishvili, R.Dzhanelidze et al. Phys. Stat. Sol., vol. 36, p 73 (1976)

G. Bagratishvili, R.Dzhanelidze et al. Thin Solid Films, vol. 56, p 209 (1979)

G.Bagratishvili, R.Dzhanelidze et al. Phis. Stat. Sol., vol. 65, p 701 (1981)

I.Nakhutsrishvili. Oriental J. Chem., vol. 36, p 850 (2020)

I.Nakhutsrishvili, R.Kokhreidze et al. Oriental J. Chem., vol. 38, p 211 (2022)

L.A.Ivanyutin, N.N.Dyachkova and B.I.Kozyrkin. Electronic Eng., vol. 6, p 105(1976)

B.Bayraktaroglu, R.Johnson et al. Nort Carolina Univ. Conf., June 18, p 207 (1980)

K.Pande, M.Chen and M.Yousuf. Solid State Electronics, vol. 24, p 1107 (1981)

K.Pande. Solid State Electronics, 1982, vol. 25, p 145 (1982)

Z.Vardosanidze, I.Nakhutsrishvili et al. Coating Sci. Technol., vol. 11, p 1 (2024)

J.Toudert and R.Serna. Opt. Materials Express, vol. 7, p 2299 (2017)

A.I.Ekimov and V.I.Safarov. JETP Letters, vol. 118, p S38 (2023)

K.Jaya Bala, A.J.Peter and Ch.W.Lee. Optik, vol. 183, p 1106 (2019)

Y.Sakata, J.Hayashi, M.Yamaraka et al. Appl. Phys., vol. 52, p 4334 (1981)

E.Ugur, M.Ledinský, T.Allen et al. Phys. Chem. Lett., vol. 13, p 7702 (2022)

J.Holovský, K.Ridzo?ová, A.Amalathas et al. Energy Lett., vol. 8, p 3221 (2023)

L.Wang, B.Liu, H.Li et al. Science, vol. 337, p 825 (2012)

Ch.An, Y.Zhou, Ch.Chen et al. Adv. Materials, vol. 32, 2002352 (2020)

Physics of hydrogenated amorphous silicon. Ed. J.Joannopoulos, p 290 (1984)

F.Martinez-Viviente, A.del Prado, I.Mártil et al. Appl. Phys., vol. 84, p 149 (2000)

D. G. Ast, M. H. Brodsky, Non-Crystalline Solids, 1980, 35/36, 611-616.

H.Schroeder. Appl. Phys., vol. 117, p 215103 (2015)

P.Mainali, P.Wagle, Ch.McPherson and D.McIlroy. Science, vol. 5, p 3 (2023)

N.F. Mott and E.A Davis. Clarendon-Press, Oxford, p 437 (1971)

S.Kim, H.Yoo and J.Choi. Sensors, vol. 23, p 2265 (2023)

P.Roy, S.Kunwar, D.Zhang et al. Adv. Electron. Materials, vol. 8, p 2101392 (2022)

D.Di Maria, D.Dong and C.Faicoly. Appl. Phys., vol. 54, p 580 (1983)

D.Jeltsema, A.Doria-Cerezo. Proceedings of the IEEE 100, p 1928 (2012)

A.Yoshikawa and Y.Sakai. Solid-State Electronics, vol. 20, p 133 (1977)

M.Bettini, K.Bachmann, E.Buehler et al., Appl. Phys., vol. 48, p 1603 (1977)

M.Purica, E.Budianu, E.Rusu and P.Arbadji. Thin Sol. Films, vol. 511, p 468 (2006)

K.Schulte, J.Daniel, D.Friedman et al. Adv. Ener. Mater vol. 14, p 2303367 (2024)

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Published

2025-05-29

How to Cite

Nakhutsrishvili, I., & Adamia , Z. (2025). Optical and Electrophysical Properties of the Germanium Oxynitride-Semiconductor Structure. OAJ Materials and Devices, 9. Retrieved from https://caip.co-ac.com/index.php/materialsanddevices/article/view/191