Effect of RGPP (Reactive Gas Pulsing Process) deposition parameters on physical properties and electrochromic performances of WOx thin films

Authors

  • Kouamé Boko Joël-Igor NDJORE Université Félix Houphouët Boigny
  • Moussa GRAFOUTE Université Félix Houphouët Boigny
  • Christophe ROUSSELOT Université Marie et Louis Pasteur

Abstract

WOx electrochromic films were deposited using an innovative method known as RGPP (Reactive Gas Pulsing Process) by varying the parameter tON which controls
the duration of oxygen pulsing. This parameter has little influence on the chemical composition and physical properties but significantly affects their electrochromic performance, particularly the discoloration time and coloration efficiency. The deposited films are sub-stoichiometric (WO?.?? – WO?.??) and transparent, with a refractive index ranging from 2.11 to 2.12 and a porosity from 15% to 16% as tON increases from 10 s to 40 s. The ion density and defects in the films vary slightly. The coloration times of films are very similar (12 s - 13 s), whereas the discoloration time varies significantly, from 71 s to 275 s for tON = 10 s to 40 s, respectively. The highest CE = 50 cm²/C was obtained for the film deposited with tON = 30 s.

References

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Published

2025-11-24 — Updated on 2025-11-24

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How to Cite

NDJORE, K. B. J.-I., GRAFOUTE, M., & ROUSSELOT, C. (2025). Effect of RGPP (Reactive Gas Pulsing Process) deposition parameters on physical properties and electrochromic performances of WOx thin films. OAJ Materials and Devices, 9. Retrieved from https://caip.co-ac.com/index.php/materialsanddevices/article/view/206